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Zinc Oxide, ZnO Sputtering Target MAK4 configuration -99.999% Oxide Magnetic film sputtering

SKU: 19501682258

4.3
DKK574.00 DKK599.00

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Zinc Oxide, ZnO Sputtering Target MAK4 configuration -99.999% Oxide Magnetic film sputteringZinc Oxide Sputtering Target 99. 999% purity 4 in dia x0. 25" thickTarget bonded to Cu OFHC backing plateBacking plate 4" dia x 0. 1" thickMAK4 configuration with keeper and vented screw Piezoelectric material, Hole transport layer for solar cell

Store: nyherosfund.org · Domain: nyherosfund.org

Description

Magnetic film sputtering

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low cost standard round Taantalum pentoxide Sputter Targets

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Zinc Oxide, ZnO Sputtering Target MAK4 configuration -99.999% Oxide Magnetic film sputteringZinc Oxide Sputtering Target 99. 999% purity 4 in dia x0. 25" thickTarget bonded to Cu OFHC backing plateBacking plate 4" dia x 0. 1" thickMAK4 configuration with keeper and vented screw Piezoelectric material, Hole transport layer for solar cell

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