Cobalt with Iron, Boron & Silicon mixture- Sputtering Targets Material Composition:Co/Fe/B (40/40/20 wt%) CaF2 single Crystal substrates and
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Cobalt with Iron, Boron & Silicon mixture- Sputtering Targets Material Composition:Co/Fe/B (40/40/20 wt%) CaF2 single Crystal substrates andHigh purity (99. 9%), low cost standard round Cobalt_Iron (50 50 wt%), Cobalt_Iron_Boron (40 20 20 wt%), Co_Fe_SI, Co_Si_B & Co_Fe_Si_B Sputter Targets * ~100% density * Low gas content * Dense and homogeneous *Small, uniform grains <100 um Contact Us : Request for Custom Sizes & compositions & Target Bonding services 30 day shipping
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